Aluminization and oxidation behavior of titanium nitride between 850° and 1150°C

Huan Te Su*, Chien-Cheng Lin

*Corresponding author for this work

研究成果: Conference contribution

摘要

The aluminization of TiN carried out isothermally in argon by the pack cementation process at temperatures ranging from 850° to 1150°C can effectively enhance its oxidation resistance. The specimens were subsequently oxidized in air at 1000°C The microstructure of the coatings was investigated using XRD, SEM/EDS, and TEM/EDS. After annealing at 850°C/10 h, the aluminized coating consisted of TiAl3 and AlN. However, the needle-like TiN was additionally formed after annealing above 1000°C Subsequent cyclic oxidation tests indicated that the aluminized TiN with 850°C can dramatically reduce its oxidation rate up to 250 h, while above 1000°C, the time period for improving the oxidation resistance of the aluminized TiN was limited within 25 h. The complex oxides consisted of three layers: an outer TiO2+Al2O3, an intermediate Al2O3-rich and an inner TiO, were formed on the specimens above 1000°C However, the mixed layer of TiO2+Al 2O3 was not found at 850°C.

原文English
主出版物標題Materials Science and Technology Conference and Exhibition 2010, MS and T'10
頁面2170-2181
頁數12
出版狀態Published - 1 十二月 2010
事件Materials Science and Technology Conference and Exhibition 2010, MS and T'10 - Houston, TX, United States
持續時間: 17 十月 201021 十月 2010

出版系列

名字Materials Science and Technology Conference and Exhibition 2010, MS and T'10
3

Conference

ConferenceMaterials Science and Technology Conference and Exhibition 2010, MS and T'10
國家United States
城市Houston, TX
期間17/10/1021/10/10

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