AES and EELS study of ErSi2 and its behaviour under ion bombardment and oxygen exposure

S. Valeri*, U. del Pennino, G. Ottaviani, P. Sassaroli, King-Ning Tu

*Corresponding author for this work

研究成果: Article同行評審

9 引文 斯高帕斯(Scopus)

摘要

We report on Auger Electron Spectroscopy (AES) and Electron Energy Loss Spectroscopy (EELS) investigations on ErSi2 : the silicide behaviour under Ar+ bombardment (1-5 KeV) and oxygen exposure at room temperature was studied. The ion beam processed surface shows a Si enrichment, resulting in an ErSi-like stoichiometry. This result suggests a predominant role of the mass difference between Er and Si in the sputtering mechanism of ErSi2 At exposure up to 103 langmuirs, both components of the silicide react with oxygen. Firstly, Er oxide is formed, in an Er2O3-like state. After the consumption of the available Er atoms in the surface layer, SiO2 starts to grow. These results are interpreted in terms of a greater heat of formation for Er oxide than for Si oxide.

原文English
頁(從 - 到)569-573
頁數5
期刊Solid State Communications
60
發行號7
DOIs
出版狀態Published - 1 一月 1986

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