Admittance loci design method for multilayer surface plasmon resonance devices

Chii Wann Lin*, Kuo-Ping Chen, Min Chi Su, Tzu-Chien Hsiao, Sue Sheng Lee, Shiming Lin, Xue jing Shi, Chih Kung Lee

*Corresponding author for this work

研究成果: Article同行評審

49 引文 斯高帕斯(Scopus)

摘要

Dielectric mirror types of multilayer structures have been applied to enhance the performance of surface plasmon resonance (SPR) devices. It demands a more robust design method than traditional Fresnel's equations. An admittance locus is a kind of optical thin film design method which has been extensively used for high performance optical coatings. We have applied this method for the design of multilayer SPR devices, including symmetric (glass|Au(40 nm)-[TiO2(20 nm)-SiO2(20 nm)]4-Au(30 nm)) and asymmetric (glass|Ag(50 nm)-[TiO2(20 nm)-SiO2(20 nm)]4-Au(20 nm)) structure. It provides a much necessary guidance for the choices of suitable optical materials, thickness, and number of layers for the intended SPR performance. With a 633 nm light source and a BK7 coupling prism under water, one can shift the resonant angle toward the critical angle and have smaller half maximum band widths (HMBW) at (64°, 2°) and (61.52°, 0.25°) for symmetric and asymmetric designs, respectively.

原文English
頁(從 - 到)219-229
頁數11
期刊Sensors and Actuators, B: Chemical
117
發行號1
DOIs
出版狀態Published - 12 九月 2006

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