A surface-silylated single-layer resist using chemical amplification for deep ultraviolet lithography: II. Limited permeation of Si compounds from liquid phase

Kow-Ming Chang, Ming Hau Tseng, I. Chung Deng, Yao Pin Tsai, Sy Jer Yeh

研究成果: Article同行評審

1 引文 斯高帕斯(Scopus)

指紋 深入研究「A surface-silylated single-layer resist using chemical amplification for deep ultraviolet lithography: II. Limited permeation of Si compounds from liquid phase」主題。共同形成了獨特的指紋。

Engineering & Materials Science

Physics & Astronomy