A novel 3D nanolens for sub-wavelength focusing by self-aligned nanolithography

Bing Rui Lu, Yifang Chen*, Shao Wei Wang, Ejaz Huq, Edward Rogers, Tsung-Sheng Kao, Xin Ping Qu, Ran Liu, Nikolay I. Zheludev

*Corresponding author for this work

研究成果: Article同行評審

5 引文 斯高帕斯(Scopus)

摘要

In this work, a novel type of nanolens based on super oscillation theory has been developed and fabricated. A self-aligned nanolithography process is developed to achieve error-free structured nanolens without the need of complex registration which always carries intrinsic errors. This fabrication technique significantly simplifies the process and reduces the production costs consequently. The success of this process will enable us to achieve focusing and imagining beyond diffraction limit, which will be presented in other communications.

原文English
頁(從 - 到)1506-1508
頁數3
期刊Microelectronic Engineering
87
發行號5-8
DOIs
出版狀態Published - 1 五月 2010

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