A Combined Process of Silicon Shadow Masking and Inkjet Printing (SSMP) for Making Graphene Oxide and Reduced Graphene Oxide Microstructures for Selective Cell Culturing Applications

Che Hao Kang, Yu Min Fu, Chin Chuan Kao, Jia Wei Yang, Ming Liang Tseng, Zih Yu Yu, Yu Ting Cheng, Guan Yu Chen, Pu Wei Wu, Chung Yu Wu

研究成果: Conference contribution

1 引文 斯高帕斯(Scopus)

摘要

This paper demonstrates a combined process of silicon shadow masking and inkjet printing (SSMP) to fabricate graphene oxide (GO) and reduced graphene oxide (rGO) line features with a width ranging from 20 to 70 μm on varieties of substrates, such as PDMS, SiO2, Kapton, etc. for selectively cell (RPE and PC-12 cells) culturing applications. The rGO with an electrical resistance of 33.48kΩ/ is characterized via a printed four point resistivity measurement structure. Owing to the characteristics of low chemical usage, low process temperature and complexity, and high fault tolerance of inkjet printers, the process technique has shown its potential for biomedical applications in terms of flexible cell culturing platform fabrication.

原文English
主出版物標題2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII
發行者Institute of Electrical and Electronics Engineers Inc.
頁面609-612
頁數4
ISBN(電子)9781728120072
DOIs
出版狀態Published - 六月 2019
事件20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII - Berlin, Germany
持續時間: 23 六月 201927 六月 2019

出版系列

名字2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII

Conference

Conference20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII
國家Germany
城市Berlin
期間23/06/1927/06/19

指紋 深入研究「A Combined Process of Silicon Shadow Masking and Inkjet Printing (SSMP) for Making Graphene Oxide and Reduced Graphene Oxide Microstructures for Selective Cell Culturing Applications」主題。共同形成了獨特的指紋。

  • 引用此

    Kang, C. H., Fu, Y. M., Kao, C. C., Yang, J. W., Tseng, M. L., Yu, Z. Y., Cheng, Y. T., Chen, G. Y., Wu, P. W., & Wu, C. Y. (2019). A Combined Process of Silicon Shadow Masking and Inkjet Printing (SSMP) for Making Graphene Oxide and Reduced Graphene Oxide Microstructures for Selective Cell Culturing Applications. 於 2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII (頁 609-612). [8808293] (2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/TRANSDUCERS.2019.8808293