X-ray topographic determination of the absence of lateral strains in ion-implanted silicon

King-Ning Tu*, P. Chaudhari, K. Lal, B. L. Crowder, S. I. Tan

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

21 Scopus citations

Abstract

The lattice-to-amorphous transformation of Si caused by implantation of silicon ions results in volumetric expansion. The expansion is primarily in a direction normal to the substrate surface. We infer this from x-ray topographic analysis where no evidence of plastic flow in the region bounding the implanted volume was detected. By measuring the unidirectional expansion, the average density of the amorphous Si layer is found to be 3.8 to 5.6% smaller than that of crystalline Si.

Original languageEnglish
Pages (from-to)4262-4263
Number of pages2
JournalJournal of Applied Physics
Volume43
Issue number10
DOIs
StatePublished - 1 Dec 1972

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