WSiN cap layer for improvement of ohmic contact morphology in AlGaN/GaN high electron mobility transistors

Chung Yu Lu, Oliver Hilt, Richard Lossy, Nidhi Chaturvedi, Wilfred John, Edward Yi Chang, Joachim Würfl, Günther Tränkle

Research output: Contribution to journalArticle

Abstract

A new technique using WSiN film as a protective cap layer of the internal ohmic metallization scheme and the GaN surface was developed to improve the surface morphology of the contact of AlGaN/GaN high electron mobility transistors (HEMTs). After annealing, this layer was selectively removed by patterning and dry etching. Metal contact surfaces covered with WSiN preserved a good surface morphology and edge definition. Moreover, the devices have a saturation current of 1A/mm and a maximum transconductance of 235 mS/mm. When biased at 30V, the output power density is 5.8 W/mm at 2GHz. These results indicate a damage-free process for the smooth ohmic contacts formation.

Original languageEnglish
Article number111003
JournalJapanese journal of applied physics
Volume48
Issue number11
DOIs
StatePublished - 1 Dec 2009

Fingerprint Dive into the research topics of 'WSiN cap layer for improvement of ohmic contact morphology in AlGaN/GaN high electron mobility transistors'. Together they form a unique fingerprint.

  • Cite this