Vibrational energy distribution of SiO produced via the chemical activation of SiH 3 OH

A. Takahara, R. Araki, A. Tezaki*, Hiroyuki Matsui

*Corresponding author for this work

Research output: Contribution to journalArticle

Abstract

Vibrationally excited SiO has been observed in the 193 nm photolysis of N 2 O/SiH 4 mixtures with and without great excess of H 2 . While SiH 4 + O( 1 D) (1) has been known to produce SiO in the mixture without H 2 , present kinetic analyses of SiO and OH indicate that SiH 3 + OH (2) is responsible for the SiO production in the mixture with H 2 . The observed nascent vibrational distributions, approximated by Boltzmann distributions of T v = 5200 ± 660 K for (1) and 2800 ± 790 K for (2), are reasonably accounted for by a statistical model assuming multi-step unimolecular decomposition of hot silanol.

Original languageEnglish
Pages (from-to)1403-1408
Number of pages6
JournalBulletin of the Chemical Society of Japan
Volume74
Issue number8
DOIs
StatePublished - 1 Aug 2001

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