Valence-level photoemission spectroscopy and photon-stimulated ion desorption studies of CH3Cl adsorbed on Al(111) surface using synchrotron radiation

S. C. Yang, J. M. Chen, C. R. Wen, Y. J. Hsu, Yuan-Pern Lee, T. J. Chuang, Y. C. Liu*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

The interaction of CH3Cl adsorbed on Al(111) surface at ∼90 K has been investigated by means of valence-level photoemission spectroscopy (PES), work function change and photon-stimulated ion desorption (PSID) using synchrotron radiation. The one-to-one correspondence between the gas-phase and the condensed-phase CH3Cl PES spectra suggests that the molecules are molecularly adsorbed without decomposition. Adsorption of CH3Cl leads to a decrease in work function of Al(111) (Δφ∼-0.6eV at a monolayer), indicating a dipole pointing away from the substrate and Cl is in direct contact with the metal. In the H+ PSID spectra, three weak thresholds are observed, at ∼9.6, ∼13.9 and ∼16.5 eV, and a major threshold appears at ∼18.9 eV. CH3+ PSID spectra show a weak threshold at ∼13.2 eV and two major thresholds near 9.0 and 16.7 eV. The desorption threshold below 18 eV may be due primarily to the single-hole excitation or Rydberg transition, whereas the ion desorption above 18 eV may result predominantly from excitations of C 2s electron correlation states.

Original languageEnglish
JournalSurface Science
Volume385
Issue number2-3
DOIs
StatePublished - 10 Aug 1997

Keywords

  • Photoemission spectroscopy
  • Photon-stimulated ion desorption
  • Synchrotron radiation

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