Using SiO x nano-films to enhance GZO Thin films properties as front electrodes of a-Si solar cells

Kow-Ming Chang*, Po Ching Ho, Shu Hung Yu, Jui Mei Hsu, Kuo Hui Yang, Chin Jyi Wu, Chia Chiang Chang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

14 Scopus citations

Abstract

One of the essential applications of transparent conductive oxides is as front electrodes for superstrate silicon thin-film solar cells. Textured TCO thin films can improve absorption of sunlight for an a-Si:H absorber during a single optical path. In this study, high-haze and low-resistivity bilayer GZO/SiO x thin films prepared using an atmospheric pressure plasma jet (APPJ) deposition technique and dc magnetron sputtering. The silicon subdioxide nano-film plays an important role in controlling the haze value of subsequent deposited GZO thin films. The bilayer GZO/SiO x (90 sccm) sample has the highest haze value (22.30%), the lowest resistivity (8.98 × 10 -4 Ω cm), and reaches a maximum cell efficiency of 6.85% (enhanced by approximately 19% compared to a sample of non-textured GZO).

Original languageEnglish
Pages (from-to)756-760
Number of pages5
JournalApplied Surface Science
Volume276
DOIs
StatePublished - 1 Jul 2013

Keywords

  • Atmospheric pressure plasma
  • Light-trapping effect
  • Transparent conductive oxide

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