Ultralow reflection from a-Si nanograss/Si nanofrustum double layers

Srikanth Ravipati, Jiann Shieh*, Fu-Hsiang Ko, Chen Chieh Yu, Hsuen Li Chen

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

20 Scopus citations


A double-layer nanostructure comprising amorphous Si nanograss on top of Si nanofrustums (NFs) with a total height of 680 nm exhibits ultralow reflection. Almost near-unity absorption and near-zero reflectance result in this layered nanostructure, over a broad range of wavelengths and a wide range of angles of incidence, due to the low packing density of a-Si and the smooth transition of the refractive index from the air to the Si substrate across both the nanograss and NF layers.

Original languageEnglish
Pages (from-to)1724-1728
Number of pages5
JournalAdvanced Materials
Issue number12
StatePublished - 25 Mar 2013


  • absorption
  • black materials
  • heterostructures
  • ultralow reflection

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