Ultrafast initial growth rate of self-assembled Ti O2 nanorod arrays fabricated by Ti anodization

Yung Huang Chang*, Hsiao Wei Lin, Chih Chen

*Corresponding author for this work

Research output: Contribution to journalArticle

9 Scopus citations

Abstract

The growth mechanism of Ti O2 nanorods fabricated by the anodization of Ti films using a mask of anodic aluminum oxide is investigated by examining the growth rate and morphology of the fabricated nanorods. It is found that the growth rate is 250 nm/s within the first 0.1 s at 117 V and decreases abruptly to 0.79 nm/s after 3 s. In addition, the diameter of the nanorods is larger near the top than near the root of the nanorods. A growth mechanism is proposed to explain these interesting phenomena.

Original languageEnglish
JournalElectrochemical and Solid-State Letters
Volume14
Issue number1
DOIs
StatePublished - 24 Jan 2011

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