Two-dimensional carrier profiling by kelvin-probe force microscopy

Bing-Yue Tsui*, Chih Ming Hsieh, Po Chih Su, Shien Der Tzeng, Shangjr Gwo

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

12 Scopus citations

Abstract

This paper reports the two-dimensional (2-D) carrier/dopant profiling technique by Kelvin-probe force microscopy (KFM). Before surface potential was measured, a feedback control circuit was used to improve signal response speed. The effect of surface treatment on the contrast in surface potential images was studied. Then the correlation between surface potential difference measured by KFM and surface carrier/dopant concentration obtained by spreading resistance profiling, the capacitance-voltage method, and secondary ion mass spectroscopy analysis was established. On the basis of these results, the carrier depth profiling of a p-n junction and the detection of a p-n junction array with small pitch have been successfully demonstrated.

Original languageEnglish
Pages (from-to)4448-4453
Number of pages6
JournalJapanese journal of applied physics
Volume47
Issue number6 PART 1
DOIs
StatePublished - 13 Jun 2008

Keywords

  • Kelvin-probe force microscopy
  • Scanning probe microscopy
  • Surface potential

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