Tuning oxidation level, electrical conductance and band gap structure on graphene sheets by a cyclic atomic layer reduction technique

Si Yong Gu, Chien Te Hsieh*, Tzu Wei Lin, Jeng-Kuei Chang, Jianlin Li, Yasser Ashraf Gandomi

*Corresponding author for this work

Research output: Contribution to journalArticle

3 Scopus citations

Abstract

The present work develops an atomic layer reduction (ALR) method to accurately tune oxidation level, electrical conductance, band-gap structure, and photoluminescence (PL) response of graphene oxide (GO) sheets. The ALR route is carried out at 200 °C within ALR cycle number of 10–100. The ALR treatment is capable of striping surface functionalities (e.g., hydroxyl, carbonyl, and carboxylic groups), producing thermally-reduced GO sheets. The ALR cycle number serves as a controlling factor in adjusting the crystalline, surface chemistry, electrical, optical properties of GO sheets. With increasing the ALR cycle number, ALR-GO sheets display a high crystallinity, a low oxidation level, an improved electrical conductivity, a narrow band gap, and a tunable PL response. On the basis of the results, the ALR technique offers a great potential for accurately tune electrical and optical properties of carbon materials through the cyclic removal of oxygen functionalities, without any complicated thermal and chemical desorption processes.

Original languageEnglish
Pages (from-to)234-241
Number of pages8
JournalCarbon
Volume137
DOIs
StatePublished - 1 Oct 2018

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