Trapping in GaN-based metal-insulator-semiconductor transistors: Role of high drain bias and hot electrons

M. Meneghini, D. Bisi, D. Marcon, S. Stoffels, M. Van Hove, Tian-Li Wu, S. Decoutere, G. Meneghesso, E. Zanoni

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Abstract

This paper describes an extensive analysis of the role of off-state and semi-on state bias in inducing the trapping in GaN-based power High Electron Mobility Transistors. The study is based on combined pulsed characterization and on-resistance transient measurements. We demonstrate that - by changing the quiescent bias point from the off-state to the semi-on state - it is possible to separately analyze two relevant trapping mechanisms: (i) the trapping of electrons in the gate-drain access region, activated by the exposure to high drain bias in the off-state; (ii) the trapping of hot-electrons within the AlGaN barrier or the gate insulator, which occurs when the devices are operated in the semi-on state. The dependence of these two mechanisms on the bias conditions and on temperature, and the properties (activation energy and cross section) of the related traps are described in the text.

Original languageEnglish
Article number143505
JournalApplied Physics Letters
Volume104
Issue number14
DOIs
StatePublished - 7 Apr 2014

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    Meneghini, M., Bisi, D., Marcon, D., Stoffels, S., Van Hove, M., Wu, T-L., Decoutere, S., Meneghesso, G., & Zanoni, E. (2014). Trapping in GaN-based metal-insulator-semiconductor transistors: Role of high drain bias and hot electrons. Applied Physics Letters, 104(14), [143505]. https://doi.org/10.1063/1.4869680