Transparent barrier coatings for flexible organic light-emitting diode applications

Dong Sing Wuu*, Tsai Ning Chen, Chia Cheng Wu, Cheng Chung Chiang, Yung Pei Chen, Ray-Hua Horng, Fuh Shyang Juang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

33 Scopus citations

Abstract

Silicon oxide (SiOx) and silicon nitride (SiNx) thin films have been deposited onto flexible polycarbonate (PC) substrates using plasma-enhanced (PE)CVD for transparent barrier applications. Comparing the internal stress, optical transparency, surface roughness, and impermeability results, a multilayer composed of parylene/SiOx/SiN x...parylene/SiOx/SiNx (PON...PON) is deposited on PC substrates and the optimum thicknesses of the SiNx, SiO x, and parylene layers is determined. Under optimum conditions, the water vapor transmission rate (WVTR) and oxygen transmission rate (OTR) of SiOx(50 nm)/SiNx(50 nm) barrier coatings on PC at 80°C decreases to values near 0.01 g m-2 per day and 0.1 cm3 m-2 per day, respectively. To further reduce the WVTR and OTR values, parylene layers are used as a smoothing, defect-decoupling, and protective medium in the multilayer. It has been found that organic light-emitting diodes capped with double PON layers show no dark spots and exhibit better emissions than single PON layers after 100 h at 25°C, and 40 % relative humidity.

Original languageEnglish
Pages (from-to)220-224
Number of pages5
JournalChemical Vapor Deposition
Volume12
Issue number4
DOIs
StatePublished - 1 Apr 2006

Keywords

  • OLEDs
  • Parylene
  • Permeation
  • Silicon nitride
  • Silicon oxide

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