Tracer diffusion in amorphous Pd80Si20 and Gd16Co84 films

D. Gupta*, King-Ning Tu, K. W. Asai

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

Evaporated Pd80Si20 and sputtered Gd16Co84 amorphous films were studied for structural relaxation during annealing with a Seeman-Bohlin X-ray diffractometer and for atomic diffusion using radioactive Au195 and Co57 tracers. The diffusion parameters for these two kinds of films with pre-annealing are presented.

Original languageEnglish
Pages (from-to)131-137
Number of pages7
JournalThin Solid Films
Volume90
Issue number2
DOIs
StatePublished - 16 Apr 1982

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