Total-Dose Effect of X-ray Irradiation on Lowerature Polycrystalline Silicon Thin-Film Transistors

Ya Hsiang Tai, Shan Yeh*, Shih Hsuan Huang, Ting Chang Chang

*Corresponding author for this work

Research output: Contribution to journalArticle

Abstract

In this paper, the total-dose effect of X-ray irradiation on lowerature polycrystalline-silicon (LTPS) thin film transistors (TFTs) is studied. Experiments under different conditions, including fixed intensity, fixed time, fixed total dose, short shot with different frequencies and high/low intensity for short/long time were performed and analyzed. With an increase of the irradiation dose, the threshold voltage ( Vth ) shifts negatively, the subthreshold swing ( S.S.) degrades and the field effect mobility decreases owing to positive trapped charges and interface traps. All magnitude of negative shifts of ( Vth ), ( S.S. ) and field effect mobility for LTPS TFTs are well correlated to the total accumulated dose. The results are consistent with ( Vth} ) shift due to trapped holes and the interface traps for mobility.

Original languageEnglish
Article number9072453
Pages (from-to)864-867
Number of pages4
JournalIEEE Electron Device Letters
Volume41
Issue number6
DOIs
StatePublished - 1 Jun 2020

Keywords

  • Lowerature polycrystalline silicon (LTPS)
  • thin-film transistor (TFT)
  • X-ray irradiation dose

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