Block copolymers have been widely studied over the last few decades because of their ability to self-assemble into well-ordered nanoscale structures. Here, we present a novel approach to fabricate nanostructures using block copolymer thin films as three-dimensional nanomasks. Polystyrene-block-polydimethylsiloxane (PS-. b-PDMS) are coated in the nanopores of anodic aluminum oxide (AAO) templates via solvent-vapor induced wetting. The morphologies of the block copolymer thin films coated on the nanopores are controlled by the annealing solvents. The PDMS domains of the coated PS-. b-PDMS thin films can then be etched selectively using HF solutions, and the patterns of the block copolymers can be transferred to the nanopore walls.
- Block copolymers
- Solvent annealing