Three-dimensional nanomasks using block copolymers confined in the nanopores of anodic aluminum oxide templates

Chiang Jui Chu, Chia Hua Lin, Pei Yun Chung, Ming Hsiang Cheng, Kai Sheng Jeng, Jiun-Tai Chen*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

Block copolymers have been widely studied over the last few decades because of their ability to self-assemble into well-ordered nanoscale structures. Here, we present a novel approach to fabricate nanostructures using block copolymer thin films as three-dimensional nanomasks. Polystyrene-block-polydimethylsiloxane (PS-. b-PDMS) are coated in the nanopores of anodic aluminum oxide (AAO) templates via solvent-vapor induced wetting. The morphologies of the block copolymer thin films coated on the nanopores are controlled by the annealing solvents. The PDMS domains of the coated PS-. b-PDMS thin films can then be etched selectively using HF solutions, and the patterns of the block copolymers can be transferred to the nanopore walls.

Original languageEnglish
Pages (from-to)52-56
Number of pages5
JournalMaterials Today Communications
Volume3
DOIs
StatePublished - 1 Jun 2015

Keywords

  • Block copolymers
  • Nanolithography
  • Nanotubes
  • Solvent annealing
  • Three-dimensional

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