Three-dimensional nanomasks using block copolymers confined in the nanopores of anodic aluminum oxide templates

Chiang Jui Chu; Chia Hua Lin; Pei Yun Chung; Ming Hsiang Cheng; Kai Sheng Jeng; Jiun-Tai Chen

doi:10.1016/j.mtcomm.2015.04.002

Three-dimensional nanomasks using block copolymers confined in the nanopores of anodic aluminum oxide templates

Chiang Jui Chu, Chia Hua Lin, Pei Yun Chung, Ming Hsiang Cheng, Kai Sheng Jeng, Jiun-Tai Chen^*

^*Corresponding author for this work

Department of Applied Chemistry

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

Block copolymers have been widely studied over the last few decades because of their ability to self-assemble into well-ordered nanoscale structures. Here, we present a novel approach to fabricate nanostructures using block copolymer thin films as three-dimensional nanomasks. Polystyrene-block-polydimethylsiloxane (PS-. b-PDMS) are coated in the nanopores of anodic aluminum oxide (AAO) templates via solvent-vapor induced wetting. The morphologies of the block copolymer thin films coated on the nanopores are controlled by the annealing solvents. The PDMS domains of the coated PS-. b-PDMS thin films can then be etched selectively using HF solutions, and the patterns of the block copolymers can be transferred to the nanopore walls.

Original language	English
Pages (from-to)	52-56
Number of pages	5
Journal	Materials Today Communications
Volume	3
DOIs	https://doi.org/10.1016/j.mtcomm.2015.04.002
State	Published - 1 Jun 2015

Keywords

Block copolymers
Nanolithography
Nanotubes
Solvent annealing
Three-dimensional

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10.1016/j.mtcomm.2015.04.002

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@article{e6ded260f43843d4b2d9ff6b9b9af5f4,

title = "Three-dimensional nanomasks using block copolymers confined in the nanopores of anodic aluminum oxide templates",

abstract = "Block copolymers have been widely studied over the last few decades because of their ability to self-assemble into well-ordered nanoscale structures. Here, we present a novel approach to fabricate nanostructures using block copolymer thin films as three-dimensional nanomasks. Polystyrene-block-polydimethylsiloxane (PS-. b-PDMS) are coated in the nanopores of anodic aluminum oxide (AAO) templates via solvent-vapor induced wetting. The morphologies of the block copolymer thin films coated on the nanopores are controlled by the annealing solvents. The PDMS domains of the coated PS-. b-PDMS thin films can then be etched selectively using HF solutions, and the patterns of the block copolymers can be transferred to the nanopore walls.",

keywords = "Block copolymers, Nanolithography, Nanotubes, Solvent annealing, Three-dimensional",

author = "Chu, {Chiang Jui} and Lin, {Chia Hua} and Chung, {Pei Yun} and Cheng, {Ming Hsiang} and Jeng, {Kai Sheng} and Jiun-Tai Chen",

year = "2015",

month = jun,

day = "1",

doi = "10.1016/j.mtcomm.2015.04.002",

language = "English",

volume = "3",

pages = "52--56",

journal = "Materials Today Communications",

issn = "2352-4928",

publisher = "Elsevier BV",

}

TY - JOUR

T1 - Three-dimensional nanomasks using block copolymers confined in the nanopores of anodic aluminum oxide templates

AU - Chu, Chiang Jui

AU - Lin, Chia Hua

AU - Chung, Pei Yun

AU - Cheng, Ming Hsiang

AU - Jeng, Kai Sheng

AU - Chen, Jiun-Tai

PY - 2015/6/1

Y1 - 2015/6/1

N2 - Block copolymers have been widely studied over the last few decades because of their ability to self-assemble into well-ordered nanoscale structures. Here, we present a novel approach to fabricate nanostructures using block copolymer thin films as three-dimensional nanomasks. Polystyrene-block-polydimethylsiloxane (PS-. b-PDMS) are coated in the nanopores of anodic aluminum oxide (AAO) templates via solvent-vapor induced wetting. The morphologies of the block copolymer thin films coated on the nanopores are controlled by the annealing solvents. The PDMS domains of the coated PS-. b-PDMS thin films can then be etched selectively using HF solutions, and the patterns of the block copolymers can be transferred to the nanopore walls.

AB - Block copolymers have been widely studied over the last few decades because of their ability to self-assemble into well-ordered nanoscale structures. Here, we present a novel approach to fabricate nanostructures using block copolymer thin films as three-dimensional nanomasks. Polystyrene-block-polydimethylsiloxane (PS-. b-PDMS) are coated in the nanopores of anodic aluminum oxide (AAO) templates via solvent-vapor induced wetting. The morphologies of the block copolymer thin films coated on the nanopores are controlled by the annealing solvents. The PDMS domains of the coated PS-. b-PDMS thin films can then be etched selectively using HF solutions, and the patterns of the block copolymers can be transferred to the nanopore walls.

KW - Block copolymers

KW - Nanolithography

KW - Nanotubes

KW - Solvent annealing

KW - Three-dimensional

UR - http://www.scopus.com/inward/record.url?scp=84949546214&partnerID=8YFLogxK

U2 - 10.1016/j.mtcomm.2015.04.002

DO - 10.1016/j.mtcomm.2015.04.002

M3 - Article

AN - SCOPUS:84949546214

VL - 3

SP - 52

EP - 56

JO - Materials Today Communications

JF - Materials Today Communications

SN - 2352-4928

ER -