Thin film silicon solar cell fabricated at 100°C by high density plasma for flexible photovoltaic application

Chang Hong Shen, Jia Min Shieh*, Hao-Chung Kuo, Jung Y. Huang, Wen Chien Yu, Wen Hsien Huang, Chao Kei Wang, Chih Wei Hsu, Yu Hsin Lin, Hung Yu Chiu, Bau Tong Dai, Fu Liang Yang

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Record fabrication temperature, 100°C, of a single junction amorphous Si solar cell was demonstrated by a high-density plasma method. Present solar cell revealed conversion efficiency of 7.4% at 200oC (4.1% at 135°C).

Original languageEnglish
Title of host publicationConference on Lasers and Electro-Optics, CLEO 2010
DOIs
StatePublished - 1 Dec 2010
EventConference on Lasers and Electro-Optics, CLEO 2010 - San Jose, CA, United States
Duration: 16 May 201021 May 2010

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Conference

ConferenceConference on Lasers and Electro-Optics, CLEO 2010
CountryUnited States
CitySan Jose, CA
Period16/05/1021/05/10

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  • Cite this

    Shen, C. H., Shieh, J. M., Kuo, H-C., Huang, J. Y., Yu, W. C., Huang, W. H., Wang, C. K., Hsu, C. W., Lin, Y. H., Chiu, H. Y., Dai, B. T., & Yang, F. L. (2010). Thin film silicon solar cell fabricated at 100°C by high density plasma for flexible photovoltaic application. In Conference on Lasers and Electro-Optics, CLEO 2010 (Optics InfoBase Conference Papers). https://doi.org/10.1364/CLEO.2010.CMAA1