Thickness determination of poly-Si/poly-oxide/poly-Si/SiO2/Si structure by ellipsometer

Tien-Sheng Chao, C. L. Lee, T. F. Lei

Research output: Contribution to journalArticlepeer-review


An ellipsometry measurement method is proposed to measure the poly-Si/poly-oxide/poly-Si/SiO2/Si structure. The thickness of each layer in this structure can be easily obtained by a conventional ellipsometry measurement. The measured result is consistent with that of cross-sectional TEM.

Original languageEnglish
Pages (from-to)1157-1159
Number of pages3
JournalElectronics Letters
Issue number13
StatePublished - 1 Jan 1993


  • Ellipsometry
  • Measurement
  • Thin films

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