Thermally Activated Diffusion Observed by in Situ Reflection High Energy Electron Diffraction Intensity Monitoring on Interrupted SrTiO3 Homoepitaxial Growth

Te Chun Wang; Jenh-Yih Juang; Kaung-Hsiung Wu; Tzeng Ming Uen; Yih Shun Gou

doi:10.1143/JJAP.43.771

Thermally Activated Diffusion Observed by in Situ Reflection High Energy Electron Diffraction Intensity Monitoring on Interrupted SrTiO₃ Homoepitaxial Growth

Te Chun Wang^*, Jenh-Yih Juang, Kaung-Hsiung Wu, Tzeng Ming Uen, Yih Shun Gou

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

The reflection high energy electron diffraction (RHEED) intensity is reported following a quadratic power law dependence on annealing time for interrupted laser ablation-grown strontium titanate films. The activation energy of 1.0 eV can further be obtained from the diffusion Arrhenius plot by assuming a direct proportionality between the RHEED intensity and the diffusion length.

Original language	English
Pages (from-to)	771-772
Number of pages	2
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	43
Issue number	2
DOIs	https://doi.org/10.1143/JJAP.43.771
State	Published - 1 Jan 2004

Keywords

Activation energy
Diffusion
Kinetics
Reflection high energy electron diffraction
RHEED

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Wang, T. C., Juang, J-Y., Wu, K-H., Uen, T. M., & Gou, Y. S. (2004). Thermally Activated Diffusion Observed by in Situ Reflection High Energy Electron Diffraction Intensity Monitoring on Interrupted SrTiO₃ Homoepitaxial Growth. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 43(2), 771-772. https://doi.org/10.1143/JJAP.43.771

Wang, Te Chun ; Juang, Jenh-Yih ; Wu, Kaung-Hsiung ; Uen, Tzeng Ming ; Gou, Yih Shun. / Thermally Activated Diffusion Observed by in Situ Reflection High Energy Electron Diffraction Intensity Monitoring on Interrupted SrTiO₃ Homoepitaxial Growth. In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 2004 ; Vol. 43, No. 2. pp. 771-772.

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abstract = "The reflection high energy electron diffraction (RHEED) intensity is reported following a quadratic power law dependence on annealing time for interrupted laser ablation-grown strontium titanate films. The activation energy of 1.0 eV can further be obtained from the diffusion Arrhenius plot by assuming a direct proportionality between the RHEED intensity and the diffusion length.",

keywords = "Activation energy, Diffusion, Kinetics, Reflection high energy electron diffraction, RHEED",

author = "Wang, {Te Chun} and Jenh-Yih Juang and Kaung-Hsiung Wu and Uen, {Tzeng Ming} and Gou, {Yih Shun}",

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Wang, TC, Juang, J-Y, Wu, K-H, Uen, TM & Gou, YS 2004, 'Thermally Activated Diffusion Observed by in Situ Reflection High Energy Electron Diffraction Intensity Monitoring on Interrupted SrTiO₃ Homoepitaxial Growth', Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, vol. 43, no. 2, pp. 771-772. https://doi.org/10.1143/JJAP.43.771

Thermally Activated Diffusion Observed by in Situ Reflection High Energy Electron Diffraction Intensity Monitoring on Interrupted SrTiO₃ Homoepitaxial Growth. / Wang, Te Chun; Juang, Jenh-Yih; Wu, Kaung-Hsiung; Uen, Tzeng Ming; Gou, Yih Shun.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 43, No. 2, 01.01.2004, p. 771-772.

Research output: Contribution to journal › Article › peer-review

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AU - Uen, Tzeng Ming

AU - Gou, Yih Shun

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AB - The reflection high energy electron diffraction (RHEED) intensity is reported following a quadratic power law dependence on annealing time for interrupted laser ablation-grown strontium titanate films. The activation energy of 1.0 eV can further be obtained from the diffusion Arrhenius plot by assuming a direct proportionality between the RHEED intensity and the diffusion length.

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KW - Diffusion

KW - Kinetics

KW - Reflection high energy electron diffraction

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