Thermally Activated Diffusion Observed by in Situ Reflection High Energy Electron Diffraction Intensity Monitoring on Interrupted SrTiO3 Homoepitaxial Growth

Te Chun Wang*, Jenh-Yih Juang, Kaung-Hsiung Wu, Tzeng Ming Uen, Yih Shun Gou

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

The reflection high energy electron diffraction (RHEED) intensity is reported following a quadratic power law dependence on annealing time for interrupted laser ablation-grown strontium titanate films. The activation energy of 1.0 eV can further be obtained from the diffusion Arrhenius plot by assuming a direct proportionality between the RHEED intensity and the diffusion length.

Original languageEnglish
Pages (from-to)771-772
Number of pages2
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume43
Issue number2
DOIs
StatePublished - 1 Jan 2004

Keywords

  • Activation energy
  • Diffusion
  • Kinetics
  • Reflection high energy electron diffraction
  • RHEED

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