Thermal stability of Cu/Ta/GaAs multilayers

Chang You Chen, Li Chang*, Edward Yi Chang, Szu Houng Chen, Der Fu Chang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

44 Scopus citations

Abstract

Copper metallization for GaAs was evaluated by using Cu/Ta/GaAs multilayers for its thermal stability. A thin Ta layer of 40 nm was sputtered on the GaAs substrate as the diffusion barrier before copper film metallization. As judged from sheet resistance, x-ray diffraction, Auger electron spectroscopy and transmission electron microscopy, the Cu/Ta films with GaAs were very stable up to 500°C without migration into GaAs. After 550°C annealing, the interfacial mixing of Ta with GaAs substrate occurred, resulting in the formation of TaAs2. At 600°C annealing, the reaction GaAs with Ta and Cu formed TaAs, TaAs2, and Cu3Ga, resulting from Cu migration and interfacial instability.

Original languageEnglish
Pages (from-to)3367-3369
Number of pages3
JournalApplied Physics Letters
Volume77
Issue number21
DOIs
StatePublished - 20 Nov 2000

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