Thermal stability and growth kinetics of Co2Si and CoSi in thin-film reactions

King-Ning Tu*, G. Ottaviani, R. D. Thompson, J. W. Mayer

*Corresponding author for this work

Research output: Contribution to journalArticle

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Abstract

We have investigated the growth of Co2Si and CoSi around 400°C in samples of Si/Co and Si/CoSi/Co. We selected the Co-Si system because CoSi is known to have a larger heat of formation than Co2Si, hence the former should be favorable for formation from the viewpoint of free energy change or driving force. However, we found that Co2Si is the one which always grows first. This leads us to conclude that it is not the driving force but rather the kinetics which governs the selective growth of thin-film intermetallic compounds. Thus, we propose here that the first phase formation is selected by the one with the lowest kinetic barrier.

Original languageEnglish
Pages (from-to)4406-4410
Number of pages5
JournalJournal of Applied Physics
Volume53
Issue number6
DOIs
StatePublished - 1 Dec 1982

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