The study of compensative structure assisted convex and concave corner structures etching by inductively coupled plasma-reactive ion etch (ICP-RIE)

Yu Hsin Lin*, Yuan Chieh Cheng, Nien Nan Chu, Wen-Syang Hsu, Yu Hsiang Tang, Po Li Chen, Chih Chung Yang, Ming Hua Hsiao, Chien Nan Hsiao

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Engineering & Materials Science