The optical properties of monolayer amorphous Al 2 O 3 -TiO 2 composite films used as HT-APSM blanks for ArF immersion lithography

Fu Der Lai*, C. Y. Huang, Fu-Hsiang Ko

*Corresponding author for this work

Research output: Contribution to journalArticle

2 Scopus citations

Abstract

Amorphous (Al 2 O 3 ) x -(TiO 2 ) 1-x composite films are prepared using r.f. unbalanced magnetron sputtering in an atmosphere of argon and oxygen at room temperature. The optical constants of (Al 2 O 3 ) x -(TiO 2 ) 1-x composite films are linearly dependent on the Al 2 O 3 mole fraction in the Al 2 O 3 -TiO 2 composite film. The optical constants of these Al 2 O 3 -TiO 2 composite films can be made to meet the optical requirements for a high transmittance attenuated phase shift mask (HT-APSM) blank by tuning the Al 2 O 3 mole fraction. The Al 2 O 3 mole fraction range that would allow the films to meet the optical requirements of an HT-APSM blank for ArF immersion lithography is calculated to be between 76% and 84%. One π-phase-shifted Al 2 O 3 -TiO 2 composite thin film to be used as an HT-APSM blank for ArF immersion lithography is fabricated and is shown to satisfy the optical requirements.

Original languageEnglish
Pages (from-to)716-720
Number of pages5
JournalMicroelectronic Engineering
Volume84
Issue number5-8
DOIs
StatePublished - 1 May 2007

Keywords

  • ArF immersion lithography
  • Composite film
  • High transmittance attenuated phase shift mask
  • Optical property

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