The optical properties of monolayer amorphous Al 2 O 3 -TiO 2 composite films used as HT-APSM blanks for ArF immersion lithography

Fu Der Lai; C. Y. Huang; Fu-Hsiang Ko

doi:10.1016/j.mee.2007.01.214

The optical properties of monolayer amorphous Al ₂ O ₃ -TiO ₂ composite films used as HT-APSM blanks for ArF immersion lithography

Fu Der Lai^*, C. Y. Huang, Fu-Hsiang Ko

^*Corresponding author for this work

National Chiao Tung University

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

Amorphous (Al ₂ O ₃ ) _x -(TiO ₂ ) _1-x composite films are prepared using r.f. unbalanced magnetron sputtering in an atmosphere of argon and oxygen at room temperature. The optical constants of (Al ₂ O ₃ ) _x -(TiO ₂ ) _1-x composite films are linearly dependent on the Al ₂ O ₃ mole fraction in the Al ₂ O ₃ -TiO ₂ composite film. The optical constants of these Al ₂ O ₃ -TiO ₂ composite films can be made to meet the optical requirements for a high transmittance attenuated phase shift mask (HT-APSM) blank by tuning the Al ₂ O ₃ mole fraction. The Al ₂ O ₃ mole fraction range that would allow the films to meet the optical requirements of an HT-APSM blank for ArF immersion lithography is calculated to be between 76% and 84%. One π-phase-shifted Al ₂ O ₃ -TiO ₂ composite thin film to be used as an HT-APSM blank for ArF immersion lithography is fabricated and is shown to satisfy the optical requirements.

Original language	English
Pages (from-to)	716-720
Number of pages	5
Journal	Microelectronic Engineering
Volume	84
Issue number	5-8
DOIs	https://doi.org/10.1016/j.mee.2007.01.214
State	Published - 1 May 2007

Keywords

ArF immersion lithography
Composite film
High transmittance attenuated phase shift mask
Optical property

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title = "The optical properties of monolayer amorphous Al 2 O 3 -TiO 2 composite films used as HT-APSM blanks for ArF immersion lithography",

abstract = " Amorphous (Al 2 O 3 ) x -(TiO 2 ) 1-x composite films are prepared using r.f. unbalanced magnetron sputtering in an atmosphere of argon and oxygen at room temperature. The optical constants of (Al 2 O 3 ) x -(TiO 2 ) 1-x composite films are linearly dependent on the Al 2 O 3 mole fraction in the Al 2 O 3 -TiO 2 composite film. The optical constants of these Al 2 O 3 -TiO 2 composite films can be made to meet the optical requirements for a high transmittance attenuated phase shift mask (HT-APSM) blank by tuning the Al 2 O 3 mole fraction. The Al 2 O 3 mole fraction range that would allow the films to meet the optical requirements of an HT-APSM blank for ArF immersion lithography is calculated to be between 76% and 84%. One π-phase-shifted Al 2 O 3 -TiO 2 composite thin film to be used as an HT-APSM blank for ArF immersion lithography is fabricated and is shown to satisfy the optical requirements.",

keywords = "ArF immersion lithography, Composite film, High transmittance attenuated phase shift mask, Optical property",

author = "Lai, {Fu Der} and Huang, {C. Y.} and Fu-Hsiang Ko",

year = "2007",

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AU - Lai, Fu Der

AU - Huang, C. Y.

AU - Ko, Fu-Hsiang

PY - 2007/5/1

Y1 - 2007/5/1

N2 - Amorphous (Al 2 O 3 ) x -(TiO 2 ) 1-x composite films are prepared using r.f. unbalanced magnetron sputtering in an atmosphere of argon and oxygen at room temperature. The optical constants of (Al 2 O 3 ) x -(TiO 2 ) 1-x composite films are linearly dependent on the Al 2 O 3 mole fraction in the Al 2 O 3 -TiO 2 composite film. The optical constants of these Al 2 O 3 -TiO 2 composite films can be made to meet the optical requirements for a high transmittance attenuated phase shift mask (HT-APSM) blank by tuning the Al 2 O 3 mole fraction. The Al 2 O 3 mole fraction range that would allow the films to meet the optical requirements of an HT-APSM blank for ArF immersion lithography is calculated to be between 76% and 84%. One π-phase-shifted Al 2 O 3 -TiO 2 composite thin film to be used as an HT-APSM blank for ArF immersion lithography is fabricated and is shown to satisfy the optical requirements.

AB - Amorphous (Al 2 O 3 ) x -(TiO 2 ) 1-x composite films are prepared using r.f. unbalanced magnetron sputtering in an atmosphere of argon and oxygen at room temperature. The optical constants of (Al 2 O 3 ) x -(TiO 2 ) 1-x composite films are linearly dependent on the Al 2 O 3 mole fraction in the Al 2 O 3 -TiO 2 composite film. The optical constants of these Al 2 O 3 -TiO 2 composite films can be made to meet the optical requirements for a high transmittance attenuated phase shift mask (HT-APSM) blank by tuning the Al 2 O 3 mole fraction. The Al 2 O 3 mole fraction range that would allow the films to meet the optical requirements of an HT-APSM blank for ArF immersion lithography is calculated to be between 76% and 84%. One π-phase-shifted Al 2 O 3 -TiO 2 composite thin film to be used as an HT-APSM blank for ArF immersion lithography is fabricated and is shown to satisfy the optical requirements.

KW - ArF immersion lithography

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