The influence of NH3 plasma treatment on Al2O 3/HfO2 gate dielectrics of TFTs with atmospheric pressure plasma jet deposited IGZO channel

Hau Yuan Huang, Chien Hung Wu*, Shui Jinn Wang, Kow-Ming Chang, Hsin Yu Hsu

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

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Engineering & Materials Science