The impact of pre/post-metal deposition annealing on negative-bias-temperature instability in HfO2 stack p-channel metal-oxide-semiconductor field effect transistors

Ying Hsin Lu, Ting Chang Chang, Szu Han Ho, Ching En Chen, Jyun Yu Tsai, Kuan Ju Liu, Xi Wen Liu, Tseung Yuen Tseng, Osbert Cheng, Cheng Tung Huang, Ching Sen Lu

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