@inproceedings{469b8d1a73df4a23b9b1b450b58e563e,
title = "The impact of microstructure and defects on moisture resistance of novel SiO x N y passivation layer for OLED applications",
abstract = " The effects of grain boundaries in passivation layer and Al hillocks on moisture resistance were studied for SiO x N y thin films deposited by modified Ar ion beam evaporation. Al hillocks are attributed to be the culprit for moisture permeation, while its density and height dictate the required number layers of passivation for OLED applications. ",
author = "Chen, {Yi Jen} and Hsu, {Kuo Yuan} and Chen, {Yin Ying} and Su, {Cheng Feng} and Tang, {Shuenn Jiun} and Leu-Jih Perng",
year = "2007",
month = dec,
day = "1",
language = "English",
isbn = "9789572852248",
series = "IDMC 2007 - International Display Manufacturing Conference and FPD Expo - Proceedings",
pages = "280--283",
booktitle = "IDMC 2007 - International Display Manufacturing Conference and FPD Expo - Proceedings",
note = "null ; Conference date: 03-07-2007 Through 06-07-2007",
}