The impact of microstructure and defects on moisture resistance of novel SiO x N y passivation layer for OLED applications

Yi Jen Chen; Kuo Yuan Hsu; Yin Ying Chen; Cheng Feng Su; Shuenn Jiun Tang; Leu-Jih Perng

The impact of microstructure and defects on moisture resistance of novel SiO _x N _y passivation layer for OLED applications

Yi Jen Chen^*, Kuo Yuan Hsu, Yin Ying Chen, Cheng Feng Su, Shuenn Jiun Tang, Leu-Jih Perng

^*Corresponding author for this work

Department of Materials Science and Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

The effects of grain boundaries in passivation layer and Al hillocks on moisture resistance were studied for SiO _x N _y thin films deposited by modified Ar ion beam evaporation. Al hillocks are attributed to be the culprit for moisture permeation, while its density and height dictate the required number layers of passivation for OLED applications.

Original language	English
Title of host publication	IDMC 2007 - International Display Manufacturing Conference and FPD Expo - Proceedings
Pages	280-283
Number of pages	4
State	Published - 1 Dec 2007
Event	International Display Manufacturing Conference and Exhibition, IDMC 2007 - Taipei, Taiwan Duration: 3 Jul 2007 → 6 Jul 2007

Publication series

Name	IDMC 2007 - International Display Manufacturing Conference and FPD Expo - Proceedings

Conference

Conference	International Display Manufacturing Conference and Exhibition, IDMC 2007
Country	Taiwan
City	Taipei
Period	3/07/07 → 6/07/07

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Chen, Y. J., Hsu, K. Y., Chen, Y. Y., Su, C. F., Tang, S. J., & Perng, L-J. (2007). The impact of microstructure and defects on moisture resistance of novel SiO _x N _y passivation layer for OLED applications. In IDMC 2007 - International Display Manufacturing Conference and FPD Expo - Proceedings (pp. 280-283). (IDMC 2007 - International Display Manufacturing Conference and FPD Expo - Proceedings).

Chen, Yi Jen ; Hsu, Kuo Yuan ; Chen, Yin Ying ; Su, Cheng Feng ; Tang, Shuenn Jiun ; Perng, Leu-Jih. / The impact of microstructure and defects on moisture resistance of novel SiO _x N _y passivation layer for OLED applications. IDMC 2007 - International Display Manufacturing Conference and FPD Expo - Proceedings. 2007. pp. 280-283 (IDMC 2007 - International Display Manufacturing Conference and FPD Expo - Proceedings).

@inproceedings{469b8d1a73df4a23b9b1b450b58e563e,

title = "The impact of microstructure and defects on moisture resistance of novel SiO x N y passivation layer for OLED applications",

abstract = " The effects of grain boundaries in passivation layer and Al hillocks on moisture resistance were studied for SiO x N y thin films deposited by modified Ar ion beam evaporation. Al hillocks are attributed to be the culprit for moisture permeation, while its density and height dictate the required number layers of passivation for OLED applications. ",

author = "Chen, {Yi Jen} and Hsu, {Kuo Yuan} and Chen, {Yin Ying} and Su, {Cheng Feng} and Tang, {Shuenn Jiun} and Leu-Jih Perng",

year = "2007",

month = dec,

day = "1",

language = "English",

isbn = "9789572852248",

series = "IDMC 2007 - International Display Manufacturing Conference and FPD Expo - Proceedings",

pages = "280--283",

booktitle = "IDMC 2007 - International Display Manufacturing Conference and FPD Expo - Proceedings",

note = "null ; Conference date: 03-07-2007 Through 06-07-2007",

}

Chen, YJ, Hsu, KY, Chen, YY, Su, CF, Tang, SJ & Perng, L-J 2007, The impact of microstructure and defects on moisture resistance of novel SiO _x N _y passivation layer for OLED applications. in IDMC 2007 - International Display Manufacturing Conference and FPD Expo - Proceedings. IDMC 2007 - International Display Manufacturing Conference and FPD Expo - Proceedings, pp. 280-283, International Display Manufacturing Conference and Exhibition, IDMC 2007, Taipei, Taiwan, 3/07/07.

The impact of microstructure and defects on moisture resistance of novel SiO _x N _y passivation layer for OLED applications. / Chen, Yi Jen; Hsu, Kuo Yuan; Chen, Yin Ying; Su, Cheng Feng; Tang, Shuenn Jiun; Perng, Leu-Jih.

IDMC 2007 - International Display Manufacturing Conference and FPD Expo - Proceedings. 2007. p. 280-283 (IDMC 2007 - International Display Manufacturing Conference and FPD Expo - Proceedings).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - The impact of microstructure and defects on moisture resistance of novel SiO x N y passivation layer for OLED applications

AU - Chen, Yi Jen

AU - Hsu, Kuo Yuan

AU - Chen, Yin Ying

AU - Su, Cheng Feng

AU - Tang, Shuenn Jiun

AU - Perng, Leu-Jih

PY - 2007/12/1

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AB - The effects of grain boundaries in passivation layer and Al hillocks on moisture resistance were studied for SiO x N y thin films deposited by modified Ar ion beam evaporation. Al hillocks are attributed to be the culprit for moisture permeation, while its density and height dictate the required number layers of passivation for OLED applications.

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M3 - Conference contribution

AN - SCOPUS:56049095096

SN - 9789572852248

T3 - IDMC 2007 - International Display Manufacturing Conference and FPD Expo - Proceedings

SP - 280

EP - 283

BT - IDMC 2007 - International Display Manufacturing Conference and FPD Expo - Proceedings

Y2 - 3 July 2007 through 6 July 2007

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Chen YJ, Hsu KY, Chen YY, Su CF, Tang SJ, Perng L-J. The impact of microstructure and defects on moisture resistance of novel SiO _x N _y passivation layer for OLED applications. In IDMC 2007 - International Display Manufacturing Conference and FPD Expo - Proceedings. 2007. p. 280-283. (IDMC 2007 - International Display Manufacturing Conference and FPD Expo - Proceedings).