The impact of fabrication errors on a flat-top grating-based planar waveguide demultiplexer

Chun-Ting Lin*, Yang Tung Huang, Jung Y. Huang

*Corresponding author for this work

Research output: Contribution to journalArticle

Abstract

The spectral performance of a demultiplexer is significantly affected by the phase and amplitude errors due to fabrication errors. We estimate the impact of fabrication errors on a flat-top grating-based planar waveguide demultiplexer using a design example. Simulation results show that the photomask resolution resulting in a phase error should be lower than 40 nm when a crosstalk criterion of -30dB is given. The impact of amplitude errors is not distinct until the reduced amount of the facet width is greater than 0.5 μm and the grating side-wall angle offset from the vertical is larger than 1°.

Original languageEnglish
Pages (from-to)7356-7358
Number of pages3
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume46
Issue number11
DOIs
StatePublished - 6 Nov 2007

Keywords

  • Crosstalk
  • Etched diffraction grating
  • Flat-top
  • Insertion loss
  • Phase and amplitude errors
  • Planar waveguide
  • Wavelength-division multiplexing (WDM)

Fingerprint Dive into the research topics of 'The impact of fabrication errors on a flat-top grating-based planar waveguide demultiplexer'. Together they form a unique fingerprint.

  • Cite this