The External Light Trapping for Perovskite Solar Cells Using Nanoimprinted Polymer Metamaterial Patterns

Albert Lin*, Sze Ming Fu, Bo Ruei Chen, Sheng Lun Yan, Yan Kai Zhong, Ming Hsuan Kao, Chang Hong Shen, Jia Min Shieh, Tseung-Yuen Tseng

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

3 Scopus citations

Abstract

In this work, we develop the process flow for nano-imprinted metamaterial patterns for perovskite solar cell light trapping. Nanoimprint can be scaled for large-area photovoltaics at low cost, compared to conventional lithography techniques. While conventional grating is normally underneath the solar cell active layers, the degraded electrical characteristic can be a problem. On the other hand, the external light trapping separates the electrical and optical designs and, therefore, it is more promising for complex photonic management without sacrificing the diode characteristics. We demonstrate the concept by perovskite solar cells with metamaterial patterns. Imprinting a deeper metamaterial pattern is suggested to enhance the far field effect for further efficiency improvement.

Original languageEnglish
Title of host publication2016 IEEE 43rd Photovoltaic Specialists Conference (PVSC)
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages334-337
Number of pages4
ISBN (Electronic)9781509027248
DOIs
StatePublished - 5 May 2016
Event43rd IEEE Photovoltaic Specialists Conference, PVSC 2016 - Portland, United States
Duration: 5 Jun 201610 Jun 2016

Publication series

NameIEEE Photovoltaic Specialists Conference
ISSN (Print)0160-8371

Conference

Conference43rd IEEE Photovoltaic Specialists Conference, PVSC 2016
CountryUnited States
CityPortland
Period5/06/1610/06/16

Keywords

  • external light trapping
  • metamaterial patterns
  • nanoimprint
  • perovskite solar cell

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