In this work, we develop the process flow for nano-imprinted metamaterial patterns for perovskite solar cell light trapping. Nanoimprint can be scaled for large-area photovoltaics at low cost, compared to conventional lithography techniques. While conventional grating is normally underneath the solar cell active layers, the degraded electrical characteristic can be a problem. On the other hand, the external light trapping separates the electrical and optical designs and, therefore, it is more promising for complex photonic management without sacrificing the diode characteristics. We demonstrate the concept by perovskite solar cells with metamaterial patterns. Imprinting a deeper metamaterial pattern is suggested to enhance the far field effect for further efficiency improvement.