The effects of plasma treatment on the thermal stability of HfAlO x thin films

Kow-Ming Chang*, Bwo Ning Chen, Shih Ming Huang

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publication2007 International Semiconductor Device Research Symposium, ISDRS
DOIs
StatePublished - 1 Dec 2007
Event2007 International Semiconductor Device Research Symposium, ISDRS - College Park, MD, United States
Duration: 12 Dec 200714 Dec 2007

Publication series

Name2007 International Semiconductor Device Research Symposium, ISDRS

Conference

Conference2007 International Semiconductor Device Research Symposium, ISDRS
CountryUnited States
CityCollege Park, MD
Period12/12/0714/12/07

Cite this

Chang, K-M., Chen, B. N., & Huang, S. M. (2007). The effects of plasma treatment on the thermal stability of HfAlO x thin films. In 2007 International Semiconductor Device Research Symposium, ISDRS [4422320] (2007 International Semiconductor Device Research Symposium, ISDRS). https://doi.org/10.1109/ISDRS.2007.4422320