The effect of trimethylgallium flows in the AlInGaN barrier on optoelectronic characteristics of near ultraviolet light-emitting diodes grown by atmospheric pressure metalorganic vapor phase epitaxy

Yi Keng Fu*, Ren Hao Jiang, Yu Hsuan Lu, Bo Chun Chen, Rong Xuan, Yen Hsiang Fang, Chia Feng Lin, Yan Kuin Su, Jenn-Fang Chen

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

30 Scopus citations

Abstract

The letter reports a theoretical and experimental study on the device performance of near ultraviolet light-emitting diodes (LEDs) with quaternary AlInGaN quantum barrier (QB). The indium mole fraction of AlInGaN QB could be enhanced as we increased the trimethylgallium flow rate. It was found the AlInGaN/InGaN LEDs can reduce forward voltage and improve light output power, compared with conventional GaN QB. By using advanced device simulation, it should be attributed to a reduction in lattice mismatch induced polarization mismatch in the active layer, which results in the suppression of electron overflow.

Original languageEnglish
Article number121115
JournalApplied Physics Letters
Volume98
Issue number12
DOIs
StatePublished - 21 Mar 2011

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