TY - JOUR
T1 - Texture evolution of transition-metal nitride thin films by ion beam assisted deposition
AU - Ma, C. H.
AU - Huang, J. H.
AU - Chen, H. D.
PY - 2004/1/15
Y1 - 2004/1/15
N2 - TiN, VN and CrN were systematically deposited on silicon substrates using ion beam assisted deposition (IBAD) technique at temperatures and ion (N 2
+) energy ranging from 300 °C to 500 °C and 100 eV to 650 eV, respectively. The results showed that the texture could be controlled by the ion beam energy, flux, and its incident angle, in conjunction with the deposition temperature. For the 0° angle of ion incidence, fiber textures were formed and could be controlled between (111) and (200) surface plane orientation by adjusting ion flux or ion energy. Three types of in-plane textures were produced, when the ion beam was incident at 45° angle, for which cases ion channeling played an important role in the formation of in-plane texture. Using the strain-energy perturbation method, the stability of texture can be further understood. Among the three in-plane textures, the (200) in-plane texture is strain-energy stable, and the others are not.
AB - TiN, VN and CrN were systematically deposited on silicon substrates using ion beam assisted deposition (IBAD) technique at temperatures and ion (N 2
+) energy ranging from 300 °C to 500 °C and 100 eV to 650 eV, respectively. The results showed that the texture could be controlled by the ion beam energy, flux, and its incident angle, in conjunction with the deposition temperature. For the 0° angle of ion incidence, fiber textures were formed and could be controlled between (111) and (200) surface plane orientation by adjusting ion flux or ion energy. Three types of in-plane textures were produced, when the ion beam was incident at 45° angle, for which cases ion channeling played an important role in the formation of in-plane texture. Using the strain-energy perturbation method, the stability of texture can be further understood. Among the three in-plane textures, the (200) in-plane texture is strain-energy stable, and the others are not.
KW - In-plane texture
KW - Ion beam
KW - Transition metal nitride
UR - http://www.scopus.com/inward/record.url?scp=0346119934&partnerID=8YFLogxK
U2 - 10.1016/j.tsf.2003.09.063
DO - 10.1016/j.tsf.2003.09.063
M3 - Article
AN - SCOPUS:0346119934
VL - 446
SP - 184
EP - 193
JO - Thin Solid Films
JF - Thin Solid Films
SN - 0040-6090
IS - 2
ER -