Temperature dependence of CH radical reactions with H2O and CH2O

S. Zabarnick*, J. W. Fleming, Ming-Chang Lin

*Corresponding author for this work

Research output: Contribution to journalArticle

20 Scopus citations

Abstract

The temperature dependence of the reactions CH+H2O and CH+CH2O were studied from 297 to 670 K in 100 torr of argon using the two-laser photolysis/LIF probe technique. The CH radicals were produced by the multiphoton dissociation of CHBr3 at 266 nm and monitored by LIF at 429.8 nm. The reaction CH+H2O is independent of total pressures between 20 and 300 torr at room temperature and can be fit to the Arrhenius expression, k=(9.49±0.05)×10-12exp[(380±20)/T] cm3s-1 for the temperature range 298 to 669 K. The reaction CH+CH2O is also independent of total pressure between 20 and 300 torr at room temperature and can be fit to the Arrhenius expression, k=(1.57±0.14)×10-10 exp[(260±30)T] cm3s-1 for the temperature range 297 to 670 K. The negative activation energies, energetics, and known CH behavior point to CH insertion into both H2O and CH2O as the primary reaction paths. The insertion products undergo rapid decomposition and collisional stabilization is unable to compete under these conditions.

Original languageEnglish
Pages (from-to)713-719
Number of pages7
JournalSymposium (International) on Combustion
Volume21
Issue number1
DOIs
StatePublished - 1 Jan 1988

Fingerprint Dive into the research topics of 'Temperature dependence of CH radical reactions with H<sub>2</sub>O and CH<sub>2</sub>O'. Together they form a unique fingerprint.

  • Cite this