Abstract
Polycrystalline diamond films were deposited on p-type (1 0 0) silicon substrate using a methane/hydrogen gas mixture in a microwave plasma-assisted chemical vapor deposition system. After the back-etched process, the Al contacts were evaporated on both sides of a 150 μm thick isolated diamond film for consecutive high-voltage measurements. It was found that the current-voltage (I-V) characteristics of the Al/diamond/Al structure exhibited two Schottky barrier diodes in a back-to-back configuration. Since the top diamond surface possessed better diamond quality than the bottom surface, the top Schottky diode with a breakdown voltage of 897 V and a lower breakdown voltage of -515 V for the bottom Schottky diode was observed for the first I-V measurement. However, the breakdown voltage was decreased by 37 and 140 V for the top and bottom Schottky diodes after the consecutive sixth repeated measurements. It was found that the oxygenated phenomenon was more prominent; in addition, the quality of the isolated diamond film was also degraded after the consecutive high-voltage measurements. It was indicated that decrease of the breakdown voltage was due to the oxidation layer and the non-diamond components on both surfaces of the isolated diamond film.
| Original language | English |
|---|---|
| Pages (from-to) | 214-217 |
| Number of pages | 4 |
| Journal | Materials Chemistry and Physics |
| Volume | 72 |
| Issue number | 2 |
| DOIs | |
| State | Published - 1 Nov 2001 |
Keywords
- AFM
- Plasma-assisted CVD
- XPS