Substrate-insensitive atomic layer deposition of plasmonic titanium nitride films

Ing Song Yu, Hsyi En Cheng, Chun Chieh Chang, Yan Wei Lin, Hou Tong Chen, Yao Chin Wang, Zu-Po Yang*

*Corresponding author for this work

Research output: Contribution to journalArticle

9 Scopus citations

Abstract

The plasmonic properties of titanium nitride (TiN) films depend on the type of substrate when using typical deposition methods such as sputtering. Here we show atomic layer deposition (ALD) of TiN films with very weak dependence of plasmonic properties on the substrate, which also suggests the prediction and evaluation of plasmonic performance of TiN nanostructures on arbitrary substrates under a given deposition condition. Our results also observe that substrates with more nitrogen-terminated (N-terminated) surfaces will have significant impact on the deposition rate as well as the film plasmonic properties. We further illustrate that the plasmonic properties of ALD TiN films can be tailored by simply adjusting the deposition and/or post-deposition annealing temperatures. Such characteristics and the capability of conformal coating make ALD TiN films on templates ideal for applications that require the fabrication of complex 3D plasmonic nanostructures.

Original languageEnglish
Pages (from-to)777-784
Number of pages8
JournalOptical Materials Express
Volume7
Issue number3
DOIs
StatePublished - 1 Mar 2017

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