Study of spin coating properties of SU-8 thick-layer photoresist

Ren-Haw Chen*, C. M. Cheng

*Corresponding author for this work

Research output: Contribution to journalConference article

6 Scopus citations

Abstract

In this paper the coating properties including film thickness, thickness uniformity and variation of viscosity of SU8 photoresist were investigated by using a spin coater and rheometer. Experimental results indicate that the coating qualities of SU8 are affected by several factors including the spinning speed, the photoresist viscosity, the initial acceleration and the duration. Some recommendations are presented for increasing the quality of SU8 spin coating in thick-film processing.

Original languageEnglish
Pages (from-to)494-501
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4345
Issue numberI
DOIs
StatePublished - 1 Jan 2001
EventAdvances in Resist Technology and Processing XVIII - Santa Clara, CA, United States
Duration: 26 Feb 200128 Feb 2001

Keywords

  • SU-8
  • Spin coating
  • Thick-layer resist
  • Thickness uniformity

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