Study of low-temperature and post-stress hysteresis in high-k gate dielectrics

You Lin Wu*, Shi Tin Lin, Chang Cheng Yang, Chien Hung Wu, Albert Chin

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publication2007 International Semiconductor Device Research Symposium, ISDRS
DOIs
StatePublished - 1 Dec 2007
Event2007 International Semiconductor Device Research Symposium, ISDRS - College Park, MD, United States
Duration: 12 Dec 200714 Dec 2007

Publication series

Name2007 International Semiconductor Device Research Symposium, ISDRS

Conference

Conference2007 International Semiconductor Device Research Symposium, ISDRS
CountryUnited States
CityCollege Park, MD
Period12/12/0714/12/07

Cite this

Wu, Y. L., Lin, S. T., Yang, C. C., Wu, C. H., & Chin, A. (2007). Study of low-temperature and post-stress hysteresis in high-k gate dielectrics. In 2007 International Semiconductor Device Research Symposium, ISDRS [4422317] (2007 International Semiconductor Device Research Symposium, ISDRS). https://doi.org/10.1109/ISDRS.2007.4422317