Study of efficiency droop in InGaN/GaN light emitting diodes with V-shape pits

Chiao Yun Chang, Heng Li, Tien-chang Lu*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

3 Scopus citations

Abstract

We invesstagated the relationship between the emission efficiency of InGaN/GaN multiple quantum wells (MQWs) and the V-shape pits (V-pits) forming along the threading dislocation (TD). The thinner InGaN/GaN MQWs on the side walls around V-pits would create higher local energy barriers, which can resist the carriers trapped into the non-radiative recombination centres within TDs. By inserting different InGaN/GaN superlattice (SLS) layers below the MQWs, sizes of V-pits could be properly controlled. It was found that the V-pit size on InGaN MQWs increased with increasing SLS layers, which could decrease energy barriers. On the contrary, the shorter distance between the TD center and V-pit boundary would increase the carrier capturing capability of TDs in smaller V-pits. By properly controlling the V-shape defect formation, the best internal quantum efficiency of about 70%f was found in the MQWs with underlying 15 periods SLS layers.

Original languageEnglish
Title of host publicationGallium Nitride Materials and Devices X
EditorsJen-Inn Chyi, Hadis Morkoc, Hiroshi Fujioka
PublisherSPIE
ISBN (Electronic)9781628414530
DOIs
StatePublished - 1 Jan 2015
EventGallium Nitride Materials and Devices X - San Francisco, United States
Duration: 9 Feb 201512 Feb 2015

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9363
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceGallium Nitride Materials and Devices X
CountryUnited States
CitySan Francisco
Period9/02/1512/02/15

Keywords

  • droop efficency
  • internal quantum efficiency (IQE)
  • V-pit defect

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