Structure and property of epitaxial titanium oxynitride grown on MgO(001) substrate by pulsed laser deposition

Hien Do*, Yue Han Wu, Van Truong Dai, Chun Yen Peng, Tzu Chun Yen, Li Chang

*Corresponding author for this work

Research output: Contribution to journalArticle

13 Scopus citations

Abstract

High-quality epitaxial TiN. xO. y films with different oxygen content were deposited on MgO(001) substrates by pulsed laser deposition method. The chemical composition of the deposited films was determined by X-ray photoelectron spectroscopy. X-ray diffraction results showed that the TiN. xO. y films are heteroepitaxially grown on MgO with good crystallinity and their lattice parameters decrease with increased oxygen concentration. Transmission electron microscopy analyses showed that TiNO films contain a low density of dislocations. Atomic force microscopy revealed very smooth surfaces of TiN. xO. y films with roughness of 0.26-0.29. nm. The resistivity of TiN. xO. y films determined by Hall measurement was about 28-33. μΩ cm. Nanoindentation measurements showed the film hardness and Young's modulus of about 23-26. GPa and 400-430. GPa, respectively.

Original languageEnglish
Pages (from-to)91-96
Number of pages6
JournalSurface and Coatings Technology
Volume214
DOIs
StatePublished - 15 Jan 2013

Keywords

  • Epitaxial growth
  • Nanoindentation
  • Pulsed laser deposition
  • Titanium oxynitride

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