Statistical methodology to identify optimal placement of on-chip process monitors for predicting fmax

Szu Pang Mu, Wen Hsiang Chang, Chia-Tso Chao, Yi Ming Wang, Ming Tung Chang, Min Hsiu Tsai

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In previous literatures, many approaches use ring oscillators or other process monitors to correlate the chip's maximum operating frequency (Fmax). But none of them focus on the placement of these on-chip process monitors (OPMs) on a chip. The placement will greatly influence the accuracy of a prediction model. In this paper, we first propose a simulation framework to sample a chip's Fmax and it's OPM result. These samples are used to develop our methodology of OPM placement and to verify the effectiveness of an OPM placement. Then, a model-fitting framework is presented to correlate the OPMs' result to chip's Fmax. Finally, we propose a methodology to idenify optimal placement of OPM for predicting Fmax. The experiments demonstrate the effectiveness of our methodology in both simulation and silicon data.

Original languageEnglish
Title of host publication2016 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2016
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781450344661
DOIs
StatePublished - 7 Nov 2016
Event35th IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2016 - Austin, United States
Duration: 7 Nov 201610 Nov 2016

Publication series

NameIEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD
Volume07-10-November-2016
ISSN (Print)1092-3152

Conference

Conference35th IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2016
CountryUnited States
CityAustin
Period7/11/1610/11/16

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