Statistical analysis of metal gate workfunction variability, process variation, and random dopant fluctuation in nano-CMOS circuits

Chih Hong Hwang*, Tien Yeh Li, Ming Hung Han, Kuo Fu Lee, Hui Wen Cheng, Yiming Li

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

7 Scopus citations

Fingerprint Dive into the research topics of 'Statistical analysis of metal gate workfunction variability, process variation, and random dopant fluctuation in nano-CMOS circuits'. Together they form a unique fingerprint.

Mathematics

Engineering & Materials Science