Stability of La2O3 metal-insulator-metal capacitors under constant voltage stress

Shu Hua Wu*, Chih Kang Deng, Tuo-Hung Hou, Bi Shiou Chiou

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

11 Scopus citations


In this study, we demonstrate the stability of high-κ La 2O3 metal-insulator-metal (MIM) capacitors under constant voltage stress (CVS). It was found that the variation in capacitance caused by CVS strongly depends on the injected charges regardless of stress biases. Furthermore, the quadratic voltage coefficient of capacitance (α) decreases with a logarithmic increase in dielectric loss. Charge trapping contributes to the relative capacitance variation under CVS while the reduced carrier mobility due to the stress-induced traps is responsible for the reduction of α. Additionally, high stability of 10-year lifetime is achieved for a 10-nm La2O3 MIM capacitor with an 11.4 fF/μm2 capacitance density.

Original languageEnglish
Article number04DB16
Pages (from-to)1-4
Number of pages4
JournalJapanese Journal of Applied Physics
Issue number4S
StatePublished - 1 Apr 2010

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