Stability of High-k thin films in moisture ambience - The effect of dissolution gas from acryl apparatus

Sadahiro Akama*, Akira Kikuchi, Junichi Tonotani, Shun Ichiro Ohmi, Hiroshi Iwai

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

High-k thin films were deposited on Si substrates by using MBD system equipped with electron beam evaporators. Then, the moisture absorption test was carried out for these samples. The effect of dissolution gas from the moisture absorption test apparatus was investigated by comparing the results with apparatus made of acryl and glass. The films in case of using acryl apparatus were dramatically degraded.

Original languageEnglish
Title of host publicationEuropean Solid-State Device Research Conference
EditorsElena Gnani, Giorgio Baccarani, Massimo Rudan
PublisherIEEE Computer Society
Pages587-590
Number of pages4
ISBN (Electronic)8890084782
DOIs
StatePublished - 2002
Event32nd European Solid-State Device Research Conference, ESSDERC 2002 - Firenze, Italy
Duration: 24 Sep 200226 Sep 2002

Publication series

NameEuropean Solid-State Device Research Conference
ISSN (Print)1930-8876

Conference

Conference32nd European Solid-State Device Research Conference, ESSDERC 2002
CountryItaly
CityFirenze
Period24/09/0226/09/02

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    Akama, S., Kikuchi, A., Tonotani, J., Ohmi, S. I., & Iwai, H. (2002). Stability of High-k thin films in moisture ambience - The effect of dissolution gas from acryl apparatus. In E. Gnani, G. Baccarani, & M. Rudan (Eds.), European Solid-State Device Research Conference (pp. 587-590). (European Solid-State Device Research Conference). IEEE Computer Society. https://doi.org/10.1109/ESSDERC.2002.194999