Size scaling of printed microstructures using a lift-off printing (LoP) process

Yu Min Fu, Yen Ju Liang, Yu-Ting Cheng*, Pu-Wei Wu

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

Inkjet printing has been one of fascinating techniques for microfabrication owing to the characteristics of low manufacturing cost, low processing temperature, low material usage,...etc. [1, 2]. In this work, a Lift-off Printing (LoP) process combining conventional photolithography and inkjet printing processes is introduced to realize printed size-scalable silver microstructures with the line width of 5 up to 70 μm and the resistivity of ∼5.7 μΩ · cm on a silicon substrate. In addition, an as-printed interdigitated capacitor with the electrode size and spacing of 10μm has been successfully demonstrated with a capacitance of 2.3 pF/mm2@10kHz.

Original languageEnglish
Title of host publication9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages530-531
Number of pages2
ISBN (Electronic)9781479947270
DOIs
StatePublished - 23 Sep 2014
Event9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014 - Waikiki Beach, United States
Duration: 13 Apr 201416 Apr 2014

Publication series

Name9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014

Conference

Conference9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014
CountryUnited States
CityWaikiki Beach
Period13/04/1416/04/14

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