Abstract
A set of numerical simulations were performed on 0.12 µm SOI MOSFET's with relatively uniform channel field and charge using the hydrodynamic model, the energy transport model, and the drift-diffusion model. The simulation results based on the advanced models (hydrodynamic and energy transport) show nearly identical results for the I–Vcharacteristics and they agreed quite well with the experimental results, while the results from drift-diffusion model do not. Also the simulation results show that both the hydrodynamic and energy transport models handle the effect of velocity overshoot on the I–V characteristic of the 0.12 µm device well.
Original language | English |
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Pages (from-to) | 333-335 |
Number of pages | 3 |
Journal | IEEE Electron Device Letters |
Volume | 16 |
Issue number | 7 |
DOIs | |
State | Published - 1 Jan 1995 |