Simulation of Deep Submicron SOI N-MOSFET Considering the Velocity Overshoot Effect

Woo Sung Choi, Young June Park, Hong Shick Min, Fariborz Assaderaghi, Chen-Ming Hu, Robert W. Dutton

Research output: Contribution to journalArticlepeer-review

6 Scopus citations


A set of numerical simulations were performed on 0.12 µm SOI MOSFET's with relatively uniform channel field and charge using the hydrodynamic model, the energy transport model, and the drift-diffusion model. The simulation results based on the advanced models (hydrodynamic and energy transport) show nearly identical results for the I–Vcharacteristics and they agreed quite well with the experimental results, while the results from drift-diffusion model do not. Also the simulation results show that both the hydrodynamic and energy transport models handle the effect of velocity overshoot on the I–V characteristic of the 0.12 µm device well.

Original languageEnglish
Pages (from-to)333-335
Number of pages3
JournalIEEE Electron Device Letters
Issue number7
StatePublished - 1 Jan 1995

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