Simulation and fabrication of silicon oxynitride array waveguide grating for optical communication

Wen Jen Liu*, Yin-Chieh Lai, Min Hang Weng, Chih Min Chen, Peng Hsiao Lee

*Corresponding author for this work

Research output: Contribution to journalConference article

1 Scopus citations

Abstract

The microstructural evolution analysis revealed over-supplied silicon atoms which would form silicon nano-crystallized structure in the amorphous optical films for lower N2O/(N2+NH3) ratio. Silicon oxynitride grown by plasma enhanced chemical vapor deposition (PECVD) is used for the realized application of high contrast waveguide. The profile and the roughness of side and top walls of waveguide reached to the manufacturing criteria of AWG device using the scanning electron microscopy (SEM). The AWG device is successfully fabricated an AWG device with 8 channels and 1.6 nm channel spacing, and the coupling loss and propagation were about -2.24 dB and -0.15 dB.cm.

Original languageEnglish
Article number09
Pages (from-to)43-54
Number of pages12
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5723
DOIs
StatePublished - 21 Jul 2005
EventOptical Components and Materials II - San Jose, CA, United States
Duration: 24 Jan 200525 Jan 2005

Keywords

  • Arrayed waveguide grating (AWG)
  • DWDM
  • Optical communication
  • PECVD
  • Silicon-oxynitride

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