Simple source/drain contact structure for solution-processed n-channel fullerene thin-film transistors

Fang-Chung Chen*, Tzung Han Tsai, Shang Chieh Chien

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

This paper describes a simple approach for reducing the contact resistances at the source/drain (S/D) contacts in solution-processed n-channel organic thin-film transistors (OTFTs). Blending poly(ethylene glycol) (PEG) into the fullerene semiconducting layer significantly improved the device performance. The PEG molecules in the blends underwent chemical reactions with the Al atoms of the electrodes, thereby forming a better organic-metal interface. Further, the rougher surface obtained after the addition of PEG could also increase the effective contact area, thereby reducing the resistance. As a result, the electrical properties of the devices were significantly improved. Unlike conventional bilayer structures, this approach allows the ready preparation of OTFTs with a low electron injection barrier at the S/D contacts.

Original languageEnglish
Pages (from-to)599-603
Number of pages5
JournalOrganic Electronics
Volume13
Issue number4
DOIs
StatePublished - 1 Jan 2012

Keywords

  • Field effect
  • Interface
  • Polymer
  • Transistor

Fingerprint Dive into the research topics of 'Simple source/drain contact structure for solution-processed n-channel fullerene thin-film transistors'. Together they form a unique fingerprint.

Cite this